In semiconductor and liquid-crystal production equipment, the gases supplied to

the process chamber react over the wafer due to the plasma or heat, and then they
are forcefully expelled by a vacuum pump.
KITZ SCT’s vacuum valves enable long-term, stable durability under such severe
conditions. In addition, for reactive gases, heating the valve from the inside of the
bellows achieves uniformity of temperature which prevents byproducts inside the
valve and realizes high sealing ability over a long period of use.